Description
Overview
1. Heat Treatment Process Equipment
Precision systems for high-temperature and vacuum-based thermal modification of metals, ceramics, and composites.
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Vacuum air quenching furnace
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Quartz tank sink furnace
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Vacuum annealing & diffusion furnaces
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Graphite purification furnace
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Vacuum melting furnace
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Continuous high-temperature graphitization furnace
Applications: annealing, diffusion, purification, graphitization up to 2400 °C.
2. Brazing Process Equipment
High-temperature vacuum brazing systems for joining advanced materials with exceptional precision and cleanliness.
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Vacuum brazing furnace
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Hot-press brazing furnace
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Hydrogen brazing furnace
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Diffusion welding furnace
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Continuous brazing furnace
Applications: vacuum joining of stainless steel, copper, ceramics, and refractory alloys.
3. Sintering Process Equipment
Comprehensive solutions for ceramic and metal densification, including pressure and continuous sintering technologies.
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Vacuum & pneumatic sintering furnaces
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Atmosphere and hot-press sintering furnaces
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Non-stop and reaction sintering furnaces
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Continuous silicon infiltration furnace
Applications: SiC, Si₃N₄, AlN ceramics, and high-performance composite materials.
4. Furnace Tube Process Equipment
Advanced tubular systems used in semiconductor and photovoltaic production.
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Horizontal low-pressure diffusion furnace
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Horizontal annealing furnace
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Tubular PECVD
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Horizontal LPCVD
Applications: oxidation, diffusion, LPCVD/PECVD thin film processes for wafer and solar-cell fabrication.
5. Crystal Growth Process Equipment
Vacuum and thermal systems for producing single crystals and advanced semiconductor materials.
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Single crystal silicon furnace
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Resistive & induction SiC crystal growth furnaces
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Liquid-phase SiC growth furnace
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Diamond crystal growth furnace
Applications: SiC and diamond substrate production.
Technical Specifications
Reviews